Arsenic implant in silicon depth profile standard
SIAL/NIST2134 - NIST SRM 2134
Product Type: Chemical
| application(s) | semiconductor |
| format | matrix material |
| grade | certified reference material |
| manufacturer/tradename | NIST® |
| packaging | pkg of each |
| Quality Level | 100  |
| Application: | The SRM is used to calibrate the secondary ion response to detect the minor and trace levels of arsenic within a silicon matrix using the analytical technique of secondary ion mass spectrometry (SIMS). |
| Features and Benefits: | • Available with a certificate documenting NIST-certified value for retained dose of 75As atoms and the dose is expressed in units of arsenic mass per unit area. • The reference and information values of elements are reported as mass fraction. • Certified values are retained dose of 75As atoms, and the dose is expressed in units of arsenic mass per unit area. • The NIST certificate is provided with expiration certificate, use, storage, handling, and maintenance instructions. |
| General description: | Each unit of SRM 2134 contains a single crystal silicon substrate, measuring 1 cm by 1 cm, which is ion-implanted with the isotope 75 As at an approximate energy of 100 keV. SRM 2134_cert  SRM 2134_SDS |
| Legal Information: | NIST is a registered trademark of National Institute of Standards and Technology |
| Other Notes: | Example analytes are listed below as a reference. Please download a current certificate at nist.gov/SRM for current analytes and certified values. Arsenic (75As) See certificate for values and more details at nist.gov/SRM. |
| RIDADR | NONH for all modes of transport |
| WGK Germany | WGK 3 |
| Flash Point(F) | Not applicable |
| Flash Point(C) | Not applicable |
| UNSPSC | 41116107 |