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Tetrakis(ethylmethylamido)hafnium(IV)

ALDRICH/725544 - packaged for use in deposition systems

Synonym: TEMAH; Tetrakis(ethylmethylamino)hafnium(IV)

CAS Number: 352535-01-4
Empirical Formula (Hill Notation): C12H32HfN4
Molecular Weight: 410.90
MDL Number: MFCD03427130
Linear Formula: [(CH3)(C2H5)N]4Hf
Product Type: Chemical
Catalog Number PKG Qty. Price Quantity
45-725544-10G 10 g
 $1450.00
1/EA		 Add To Favorites
Figure 2. Steel cylinder for use in Atomic Layer Deposition (ALD) systems.

 

bp 78 °C/0.01 mmHg (lit.)
density 1.324 g/mL at 25 °C (lit.)
form liquid
InChI 1S/4C3H8N.Hf/c4*1-3-4-2;/h4*3H2,1-2H3;/q4*-1;+4
InChI key NPEOKFBCHNGLJD-UHFFFAOYSA-N
mp <-50 °C
Quality Level 100 
reaction suitability core: hafnium
  reagent type: catalyst
SMILES string CCN(C)[Hf](N(C)CC)(N(C)CC)N(C)CC
storage temp. 2-8°C
Application: Precursors Packaged for Depositions Systems 
Application: TEMAH is used as a precursor for atomic layer deposition(ALD) of conformal thin films of hafnium oxide (HfO2) and hafnium zirconium oxide (Hf1-xZrxO2), which are used as dielectric films in semiconductor fabrication because of their high dielectric constants.

TEMAH is well-suited for ALD because its adsorption is self-limiting on a number of substrates including glass, indium-tin oxide(ITO), Si(100), and two-dimensional materials like MoS2. TEMAH also conveniently reacts with either water or ozone as the oxygen-source in the ALD process.
Features and Benefits: This TEMAH is packaged in a Swagelok stainless-steeldeposition system convenient for connecting to ALD systems.

• Steel cylinder connected to 316 stainless steelball-valve
• 1/4 inch male Swagelok VCR connections
General description: Tetrakis(ethylmethylamido)hafnium(IV) (TEMAH) is a colorlessliquid, which freezes at -50 °C and boils around 78 °C at 0.1 Torr. It is air-and water-sensitive.
Packaging: 10 g in stainless steel cylinder
bp 78 °C/0.01 mmHg (lit.)
mp <-50 °C
Density 1.324 g/mL at 25 °C (lit.)
Storage Temp. 2-8°C
UNSPSC 12352103

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