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Tungsten etchant

ALDRICH/667498

Synonym: Tungsten etch

MDL Number: MFCD08705365
Product Type: Chemical

Catalog Number PKG Qty. Price Quantity
45-667498-500ML 500 mL
$103.00
1/EA
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Quality Level 100 
Application: Selective etchants for tungsten thin-film metallizations used in semiconductor and microelectronics technology. Etchants are buffered, mildly alkaline ferricyanide-based formulations providing high resolution patterns with minimal undercutting and photoresist compatibility. Etchant is ready to use (no dilution required). Controlled, uniform etching is achieved by immersion or spray etch technique. Etch Capacity (rate declines at ∼70%) of 64 g/gallon. Recommended Operating Temperatures: 20-80 °C (30-40 °C most common).
General description: Tungsten etchant is a mixture of potassium hydroxide and potassium ferricyanide based solution that facilitates the removal of tungsten and other materials like aluminium by dipping the substrate into the etching solution.
Packaging: 500 mL in poly bottle
Preparation Note: 1. Select your etching method according to the table below
Etch Rate (Immersion) Etch Rate (Spray)
• 20°C = 30 Å/second
• 30°C = 140 Å/second 20°C = 80 Å/second
• 60°C = 250 Å/second

2. Rinse with DI water
UNSPSC 12352300

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