Ceramic Etchant A
ALDRICH/667447
Synonym: Al2O3 Etch; Aluminum Oxide Etchant; GaN Etch; Gallium Nitride Etchant; Si3N4 Etch; Silicon Nitride Etchant
MDL Number: MFCD08705343
Product Type: Chemical
| Quality Level | 100 ![]() |
| Application: | Useful for fast and controllable etching of silicon nitride (Si3N4), galium nitride (GaN), or aluminum oxide (Al2O3). |
| Features and Benefits: | Etch Rates @ 180 °C: Aluminum oxide 120 Å/min Silicon nitride 125 Å/min Gallium nitride 80 Å/min Silicon dioxide 1 Å/min Silicon 1 Å/min |
| Packaging: | 500 mL in glass bottle |
| Symbol | ![]() GHS05,GHS07 |
| Signal word | Danger |
| Hazard statements | H290 - H302 - H314 |
| Precautionary statements | P234 - P270 - P280 - P301 + P312 - P303 + P361 + P353 - P305 + P351 + P338 |
| Hazard Codes | C |
| Risk Statements | 34 |
| Safety Statements | 26-45 |
| RIDADR | UN 1805 8 / PGIII |
| WGK Germany | WGK 1 |
| Flash Point(F) | Not applicable |
| Flash Point(C) | Not applicable |
| UNSPSC | 12352300 |



