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Tris(tert-butoxy)silanol

ALDRICH/553468 - 99.999%

Synonym: TBS

CAS Number: 18166-43-3
Empirical Formula (Hill Notation): C12H28O4Si
Molecular Weight: 264.43
MDL Number: MFCD00271024
Linear Formula: ((CH3)3CO)3SiOH
Product Type: Chemical
Catalog Number PKG Qty. Price Quantity
45-553468-5G 5 g
 $115.00
1/EA		 Add To Favorites
45-553468-25G 25 g
 $433.00
1/EA		 Add To Favorites
This picture is provided solely for illustration purposes. Optical properties of the actual product may deviate. Relevant product information is printed on labeled products and other accompanying or available information material. This image depicts SKU: 553468-25G
This picture is provided solely for illustration purposes. Optical properties of the actual product may deviate. Relevant product information is printed on labeled products and other accompanying or available information material. This image depicts SKU: 553468-5G

 

assay 99.999%
bp 205-210 °C (lit.)
form solid
InChI 1S/C12H28O4Si/c1-10(2,3)14-17(13,15-11(4,5)6)16-12(7,8)9/h13H,1-9H3
InChI key HLDBBQREZCVBMA-UHFFFAOYSA-N
mp 63-65 °C (lit.)
Quality Level 100 
SMILES string CC(C)(C)O[Si](O)(OC(C)(C)C)OC(C)(C)C
Application: Tris(tert-alkoxy)silanols reacts with tetrakis(dimethylamino)-hafnium vapor(Hf(N(CH3)2)4) for vapor phase deposition of hafnium silicate glass films. Tris(tert-butoxy)silanol is used for atomic layer deposition (ALD) of highly conformal layers of amorphous silicon dioxide and aluminum oxide nanolaminates.
General description: Tris(tert-butoxy)silanol can react with various metal alkyl amides to act as precursors for vapor deposition metal silicates. It also acts as a suitable precursor for deposition of silica.
Packaging: 5, 25 g in glass bottle
RIDADR NONH for all modes of transport
WGK Germany WGK 3
Flash Point(F) Not applicable
Flash Point(C) Not applicable
Purity 99.999%
bp 205-210 °C (lit.)
mp 63-65 °C (lit.)
UNSPSC 12352103

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